Laboratory for Epitaxial Nanostructures on Silicon and Spintronics

• L-NESS
• Research Groups
• Facilities
  • LEPECVD
  • III-V MBE
  • Electron beam lithography
  • Optical lithography
  • Reactive ion etching
  • Atomic force microscopy
  • X-ray diffraction
  • Cryostat
  • Positron Spectrometers
  • Clean room
• People
• Work & Study
• History
• Contact details

Affiliated Institutions

• Polo di Como
• Politecnico di Milano
• Università Milano Bicocca

Optical lithography

The group is equipped with a Karl Suss MA56 mask aligner (contact and proximity printing, 4” wafers, 5” masks, i-line, 20 mWcm^-2). The aligner is used to pattern SiGe heterostructures.

Fig. 1. Our Karl Suss MA56 mask aligner