L-NESS

Laboratory for Epitaxial Nanostructures on Silicon and Spintronics

Affiliated Institutions

Optical lithography

The group is equipped with a Karl Suss MA56 mask aligner (contact and proximity printing, 4” wafers, 5” masks, i-line, 20 mWcm-2). The aligner is used to pattern SiGe heterostructures.

Fig. 1. Our Karl Suss MA56 mask aligner

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Last updated: 11th July 2016