Laboratory for Epitaxial Nanostructures on Silicon and Spintronics

• L-NESS
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• Research Groups
• Facilities
• People
• Work & Study
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Affiliated Institutions

• Polo di Como
• Politecnico di Milano
• Università Milano Bicocca

News

4 May	2012	X-ray diffraction maps uniaxial strain in a single nanostructure, work performed at ESRF beamline ID13 as a collaboration between the Nanoscale Device and SiGe epitaxy groups
16 Mar	2012	The SiGe epitaxy group makes the cover of Science for its work on Scaling Hetero-Epitaxy from Layers to Three-Dimensional Crystals in collaboration with the ETH Zürich, the Università di Milano-Bicocca and the Centre Suisse d'Electronique et de Microtecnique at Neuchâtel In arrivo nuovi materiali: semplicemente “perfetti” Ricercatori italiani sulla copertina di Science: con la loro tecnica più facile produrre materiali per l'hi-tech Il futuro della tecnologia su nano-colonne di Como Il materiale perfetto? Nasce a Milano ed è figlio della fortuna Submicrometre diffraction in dense arrays of three-dimensional germanium crystals: an ESRF Spotlight on Science Communicato stampa: Materiali perfetti? Ecco come ottenerli The cover of the 16th March issue of Science, featuring Ge crystals grown by LEPECVD on Si pillars. The growth was carried out at the L-NESS by Claudiu Falub, visiting from the ETH Zürich, and this scanning-electron microscopy image was taken by Claudiu at the ETHZ FIRST laboratory.
3 Nov	2011	Dal Nobel al mercato: il grafene parla italiano (in Italian) - collaboration between the Nanoscale Device Group and Directa Plus
14 Apr	2011	The Postron Annihilation Spectroscopy group featured in Così faremo volare davvero la nave di Star Trek da Como (in Italian) - video
9 Nov	2010	Nanoribbons make good memories
1 Sep	2010	The GREEN Silicon FET-Proactive EU Project begins, with the SiGe epitaxy group playing a fundamental role
31 Aug	2010	L'iPhone e la Wii parlano anche comasco (in Italian)
6 Apr	2010	Spintronics wins Cariplo grant for SpinBioMed
18 Jan	2010	New L-NESS website goes online
1 Nov	2009	The 8th ESPS-NIS will be held in Como, 14-18th June 2010
7 Apr	2008	Il Sole 24 ORE visit the L-NESS

L-NESS

The L-NESS occupies a unique position in the Italian research landscape because of the extraordinary concentration of research infrastructure:

• advanced deposition equipment for semiconductor and oxide hetero-epitaxy:
  • SiGe low-energy plasma-enhanced chemical vapor deposition (LEPECVD)
  • SiGe and epi-oxide molecular beam epitaxy (MBE) with in-situ RHEED, XPS and STM
  • SiGe magnetron sputter epitaxy (MSE) with in-situ STM
  • III-V MBE with in-situ RHEED
  • deposition of epi-oxides and metals (PLD/MBE cluster tool with in-situ XPS/UPS, IPES, RHEED, LEED; magnetron sputtering cluster tool)
• advanced e-beam lithography fabrication facility (nanoscale device group).
• advanced characterization equipment for thin films, with a special emphasis on the characterization of advanced heterostructures and defects in materials.
• advanced atomistic modelling know-how (ab initio and semi-empirical).

Due in part to the origins of the centre, the L-NESS workforce is very international, and English is commonly used as the working language. Active research links are maintained with research labs located

• in Europe
  • ETH (Zürich)
  • Max Planck Institute for Solid State Research (Stuttgart)
  • Paul Scherrer Institut (Villigen)
  • Philipps-Universität Marburg
  • Université Paris-Sud
  • Minatec (Grenoble)
  • Université Paul Cézanne (Marseille)
  • IMEC (Leuven)
  • Helsinki University of Technology
  • CIC nanoGUNE (San Sebastián)
  • DTU Nanotech (Copenhagen)
  • COBRA Research Institute (Eindhoven)
• and elsewhere in the world
  • University of Sydney
  • National Institute of Materials Science (Tsukuba)
  • Anan National College of Technology

The multidisciplinary approach of the L-NESS is reflected in intense collaborations among researchers active in the growth of materials, their characterization, and their atomistic modeling. Finally, a strong emphasis is placed on developing strategic partnerships with the global high-tech industry.