Posters presented at XTOP 2014
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X-ray nanodiffraction in lithographically-defined semiconductor structures
Daniel Chrastina, Valeria Mondiali, Monica Bollani, Jacopo Frigerio, Marco Fiocco, Emiliano Bonera
Publications
- D. Scopece, F. Montalenti, M. Bollani, D. Chrastina, and E. Bonera: Strained Ge bulk and nanomembranes for optoelectronic applications: a systematic numerical analysis, Semicond. Sci. Technol. 29, 095012 (2014).
- E. Bonera, M. Bollani, D. Chrastina, F. Pezzoli, A. Picco, O. G. Schmidt, and D. Terziotti: Substrate strain manipulation by nanostructure perimeter forces, J. Appl. Phys. 113, 164308 (2013).
- M. Bollani, D. Chrastina, M. Fiocco, V. Mondiali, J. Frigerio, L. Gagliano, and E. Bonera: Lithographically-defined low dimensional SiGe nanostripes as silicon stressors, J. Appl. Phys. 112, 094318 (2012).
- D. Chrastina, G. M. Vanacore, M. Bollani, P. Boye, S. Schöder, M. Burghammer, R. Sordan, G. Isella, M. Zani, and A. Tagliaferri: Patterning-induced strain relief in single lithographic SiGe nanostructures studied by nanobeam x-ray diffraction, Nanotechnology 23, 155702 (2012).
Dislocation engineering in SiGe on periodic and aperiodic Si(001) templates studied by fast scanning X-ray nanodiffraction
Valeria Mondiali, Monica Bollani, Stefano Cecchi, Marie-Ingrid Richard, Tobias Schulli, Gilbert Chahine, Daniel Chrastina
Publications
- J. G. Fiorenza, G. Braithwaite, C. W. Leitz, M. T. Currie, J. Yap, F. Singaporewala, V. K. Yang, T. A. Langdo, J. Carlin, M. Somerville, A. Lochtefeld, H. Badawi, and M. T. Bulsara: Film thickness constraints for manufacturable strained silicon CMOS, Semicond. Sci. Technol. 19, L4 (2004).
- M. Grydlik, F. Boioli, H. Groiss, R. Gatti, M. Brehm, F. Montalenti, B. Devincre, F. Schäffler, and L. Miglio: Misfit dislocation gettering by substrate pit-patterning in SiGe films on Si(001), Appl. Phys. Lett. 101, 013119 (2012).
- T. Etzelstorfer, M. J. Süess, G. L. Schiefler, V. L. R. Jacques, D. Carbone, D. Chrastina, G. Isella, R. Spolenak, J. Stangl, H. Sigg, and A. Diaz: Scanning x-ray strain microscopy of inhomogeneously strained Ge micro-bridges, J. Synchrotron Rad. 21, 111 (2014).
- V. Mondiali, M. Bollani, S. Cecchi, M.-I. Richard, T. Schülli, G. Chahine, and D. Chrastina: Dislocation engineering in SiGe on periodic and aperiodic Si(001) templates studied by fast scanning X-ray nanodiffraction, Appl. Phys. Lett. 104, 021918 (2014).
- G. A. Chahine, M.-I. Richard, R. A. Homs-Regojo, T. N. Tran-Caliste, D. Carbone, V. L. R. Jaques, R. Grifone, P. Boesecke, J. Katzer, I. Costina, H. Djazouli, T. Schroeder, and T. U. Schülli: Imaging of strain and lattice orientation by quick scanning X-ray microscopy combined with three-dimensional reciprocal space mapping, J. Appl. Cryst. 47, 762 (2014).
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