Poster presented at FisMat 2015
X-ray nanodiffraction in lithographically-defined semiconductor structures
Daniel Chrastina, Dominik Kriegner, Stefano Cecchi, Mario Lodari, Valeria Mondiali, Jacopo Frigerio, Michael Barget, Emiliano Bonera, Monica Bollani
Publications
- M. Bollani, D. Chrastina, L. Gagliano, L. Rossetto, D. Scopece, M. Barget, V. Mondiali, J. Frigerio, M. Lodari, F. Pezzoli, F. Montalenti, and E. Bonera: Local uniaxial tensile strain in germanium up to 4% by epitaxial nanostructures, Appl. Phys. Lett. 107, 083101 (2015).
- V. Mondiali, M. Lodari, D. Chrastina, M. Barget, E. Bonera, and M. Bollani: Micro and nanofabrication of SiGe/Ge bridges and membranes by wet-anisotropic etching, Microelectron. Eng. 141, 256 (2015).
- M. Bollani, D. Chrastina, M. Fiocco, V. Mondiali, J. Frigerio, L. Gagliano, and E. Bonera: Lithographically-defined low dimensional SiGe nanostripes as silicon stressors, J. Appl. Phys. 112, 094318 (2012).
- D. Chrastina, G. M. Vanacore, M. Bollani, P. Boye, S. Schöder, M. Burghammer, R. Sordan, G. Isella, M. Zani, and A. Tagliaferri: Patterning-induced strain relief in single lithographic SiGe nanostructures studied by nanobeam x-ray diffraction, Nanotechnology 23, 155702 (2012).
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