Riccardo Rubert
Master's student
Contact
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Main Research Interest
Publications
- V. Mondiali, M. Bollani, D. Chrastina, R. Rubert, G. Chahine, M. I. Richard, S. Cecchi, L. Gagliano, E. Bonera, T. Schülli, and L. Miglio: Strain release management in SiGe/Si films by substrate patterning, Appl. Phys. Lett. 105, 242103 (2014).
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