Laboratory for Epitaxial Nanostructures on Silicon and Spintronics

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Affiliated Institutions

• Polo di Como
• Politecnico di Milano
• Università Milano Bicocca

Johann Osmond

PhD student

Johann Osmond completed his PhD in 2008 and is now at the ICFO in Barcelona, Spain.

Main Research Interest

• Photolithography and Ge photodiodes

Publications

1. M. Celebrano, M. Baselli, M. Bollani, J. Frigerio, A. B. Shehata, A. Della Frera, A. Tosi, A. Farina, F. Pezzoli, J. Osmond, X. Wu, B. Hecht, R. Sordan, D. Chrastina, G. Isella, L. Duò, M. Finazzi, and P. Biagioni: Emission engineering in germanium nanostructures, ACS Photonics 2, 53 (2014).
2. G. M. Vanacore, M. Zani, M. Bollani, E. Bonera, G. Nicotra, J. Osmond, G. Capellini, G. Isella, and A. Tagliaferri: Monitoring the kinetic evolution of self-assembled SiGe islands grown by Ge surface thermal diffusion from a local source, Nanotechnology 25, 135606 (2014).
3. M. Bollani, J. Osmond, G. Nicotra, C. Spinella, and D. Narducci: Strain-induced generation of silicon nanopillars, Nanotechnology 24, 335302 (2013).
4. G. M. Vanacore, M. Zani, M. Bollani, D. Colombo, G. Isella, J. Osmond, R. Sordan, and A. Tagliaferri: Size evolution of ordered SiGe islands grown by surface thermal diffusion on pit-patterned Si(100) surface, Nanoscale Res. Lett. 5, 1921 (2010).
5. G. M. Vanacore, M. Zani, G. Isella, J. Osmond, M. Bollani, and A. Tagliaferri: Quantitative investigation of the influence of carbon surfactant on Ge surface diffusion and island nucleation on Si(100), Phys. Rev. B 82, 125456 (2010).
6. P. Chaisakul, D. Marris-Morini, G. Isella, D. Chrastina, X. Le Roux, E. Gatti, S. Edmond, J. Osmond, E. Cassan, and L. Vivien: Ge/SiGe quantum wells structures for optical modulation.In IEEE 7^th Int. Conf. Group IV Photonics, 63--65 (2010).
7. P. Chaisakul, D. Marris-Morini, G. Isella, D. Chrastina, X. L. Roux, E. Gatti, S. Edmond, J. Osmond, E. Cassan, and L. Vivien: Quantum-confined Stark effect measurements in Ge/SiGe quantum well structures, Optics Lett. 35, 2913 (2010).
8. J. Osmond, L. Vivien, J.-M. Fédéli, D. Marris-Morini, P. Crozat, J.-F. Damlencourt, E. Cassan, and Y. Lecunff: 40 Gb/s surface-illuminated Ge-on-Si photodetectors, Appl. Phys. Lett. 95, 151116 (2009).
9. J. Osmond, G. Isella, D. Chrastina, R. Kaufmann, M. Acciarri, and H. von Känel: Ultra low dark current Ge/Si(100) photodiodes with low thermal budget, Appl. Phys. Lett. 94, 201106 (2009).
10. J. Osmond, G. Isella, D. Chrastina, R. Kaufmann, and H. von Känel: High speed Ge photodetector integrated on silicon-on-insulator operating at very low bias voltage.In IEEE 5^th Int. Conf. Group IV Photonics, 164--166 (2008).
11. J. Osmond, G. Isella, D. Chrastina, R. Kaufmann, and H. von Känel: Ge/Si (100) heterojunction photodiodes fabricated from material grown by low-energy plasma-enhanced chemical vapour deposition, Thin Solid Films 517, 380 (2008).
12. R. Sordan, A. Miranda, J. Osmond, D. Colombo, D. Chrastina, G. Isella, and H. von Känel: Gate-controlled rectifying barrier in a two-dimensional hole gas, Nanotechnology 19, 335201 (2008).
13. G. Isella, J. Osmond, M. Kummer, R. Kaufmann, and H. von Känel: Heterojunction photodiodes fabricated from Ge/Si (100) layers grown by low-energy plasma-enhanced CVD, Semicond. Sci. Technol. 22, S26 (2007).
14. R. Sordan, A. Miranda, J. Osmond, D. Chrastina, G. Isella, and H. von Känel: Logic gates with a single Hall bar heterostructure, Appl. Phys. Lett. 89, 152122 (2006).